CAS 19782-68-4|Tetrakis(dimethylamido)hafnium

Introduction：Basic information about CAS 19782-68-4|Tetrakis(dimethylamido)hafnium, including its chemical name, molecular formula, synonyms, physicochemical properties, and safety information, etc.

Table of Contents

1. Names
2. Chemical & Physical Properties
3. Safety Information
4. Articles4
5. Synonyms

Common Name	Tetrakis(dimethylamido)hafnium
CAS Number	19782-68-4	Molecular Weight	354.79300
Density	1.098 g/mL at 25 °C	Boiling Point	6.1ºC at 760 mmHg
Molecular Formula	C₈H₂₄HfN₄	Melting Point	26-29ºC(lit.)
MSDS	ChineseUSA	Flash Point	109 °F
Symbol	GHS02, GHS05	Signal Word	Danger

Names

Name	tetrakis(dimethylamido)hafnium(iv),
Synonym	More Synonyms

Chemical & Physical Properties

Density	1.098 g/mL at 25 °C
Boiling Point	6.1ºC at 760 mmHg
Melting Point	26-29ºC(lit.)
Molecular Formula	C₈H₂₄HfN₄
Molecular Weight	354.79300
Flash Point	109 °F
Exact Mass	356.14700
PSA	12.96000
LogP	0.04920
Appearance of Characters	crystal \| colorless to pale yellow
InChIKey	ZYLGGWPMIDHSEZ-UHFFFAOYSA-N
SMILES	C[N-]C.C[N-]C.C[N-]C.C[N-]C.[Hf+4]

Safety Information

Symbol	GHS02, GHS05
Signal Word	Danger
Hazard Statements	H228-H261-H314
Supplemental HS	Reacts violently with water.
Precautionary Statements	P210-P231 + P232-P280-P305 + P351 + P338-P370 + P378-P402 + P404
Personal Protective Equipment	Eyeshields;Faceshields;full-face particle respirator type N100 (US);Gloves;respirator cartridge type N100 (US);type P1 (EN143) respirator filter;type P3 (EN 143) respirator cartridges
Hazard Codes	F: Flammable;C: Corrosive;
Risk Phrases	R11
Safety Phrases	6-26-36/37/39-43-45
RIDADR	UN 3396 4
WGK Germany	3

Articles4

Appl. Phys. Lett. 91 , 193503, (2007)

Surface morphology and crystallinity control in the atomic layer deposition (ALD) of hafnium and zirconium oxide thin films Hausmann DM, Gordon RG

J. Cryst. Growth 249 , 251-261, (2003)

The Savannah ALD System - An Excellent Tool for Atomic Layer Deposition Monsma D, Becker J

Material Matters 1(3) , 5, (2006)

Synonyms

MFCD01862473

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