Introduction:Basic information about CAS 352535-01-4|Tetrakis(ethylmethylamino)hafnium, including its chemical name, molecular formula, synonyms, physicochemical properties, and safety information, etc.
2921199090 other acyclic monoamines and their derivatives; salts thereof VAT:17.0% Tax rebate rate:9.0% Supervision conditions:none MFN tariff:6.5% General tariff:30.0%
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In situ reaction mechanism studies on ozone-based atomic layer deposition of Al(2)O(3) and HfO(2).
ACS Appl. Mater. Interfaces 2 , 347, (2010)
The mechanisms of technologically important atomic layer deposition (ALD) processes, trimethylaluminium (TMA)/ozone and tetrakis(ethylmethylamino)hafnium (TEMAH)/ozone, for the growth of Al(2)O(3) and...