Introduction:Basic information about 1,1,3,3,5,5-hexaethoxy-1,3,5-trisilacyclohexane CAS 17955-67-8, including its chemical name, molecular formula, synonyms, physicochemical properties, and safety information, etc.
Table of Contents
- 1. 1,1,3,3,5,5-hexaethoxy-1,3,5-trisilacyclohexane Basic information
- 2. 1,1,3,3,5,5-hexaethoxy-1,3,5-trisilacyclohexane Chemical Properties
- 3. Safety Information
- 4. 1,1,3,3,5,5-hexaethoxy-1,3,5-trisilacyclohexane Usage And Synthesis
- 5. 1,1,3,3,5,5-hexaethoxy-1,3,5-trisilacyclohexane Preparation Products And Raw materials
1,1,3,3,5,5-hexaethoxy-1,3,5-trisilacyclohexane Basic information
| Product Name: | 1,1,3,3,5,5-hexaethoxy-1,3,5-trisilacyclohexane |
| Synonyms: | 1,1,3,3,5,5-hexaethoxy-1,3,5-trisilacyclohexane;1,1,3,3,5,5-Hexaethoxy-1,3,5-Trisilinane;1,3,5-Trisilacyclohexane, 1,1,3,3,5,5-hexaethoxy-;DKFELEX0087;DKSI070;1,1,3,3,5,5-Hexaethoxy-1,3,5-trisilacyclohexane - [H94023] |
| CAS: | 17955-67-8 |
| MF: | C15H36O6Si3 |
| MW: | 396.7 |
| EINECS: | |
| Product Categories: | |
| Mol File: | 17955-67-8.mol |
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1,1,3,3,5,5-hexaethoxy-1,3,5-trisilacyclohexane Chemical Properties
| Boiling point | 133°C/5mmHg(lit.) |
| density | 1.0512 |
| refractive index | 1.4360 to 1.4400 |
| storage temp. | Store at room temperature, keep dry and cool |
| form | clear liquid |
| color | Colorless to Almost colorless |
| Specific Gravity | 1.0152 |
| Hydrolytic Sensitivity | 7: reacts slowly with moisture/water |
| InChI | InChI=1S/C15H36O6Si3/c1-7-16-22(17-8-2)13-23(18-9-3,19-10-4)15-24(14-22,20-11-5)21-12-6/h7-15H2,1-6H3 |
| InChIKey | SPEDTQCGQOZHQP-UHFFFAOYSA-N |
| SMILES | [Si]1(OCC)(OCC)C[Si](OCC)(OCC)C[Si](OCC)(OCC)C1 |
Safety Information
1,1,3,3,5,5-hexaethoxy-1,3,5-trisilacyclohexane Usage And Synthesis
| Uses | 1,1,3,3,5,5-hexaethoxy-1,3,5-trisilacyclohexane is a known organosilane building block that can be used to synthesize PMO thin films[1] and EMA-2 materials[2]. PMO thin films can be used as one of the candidate materials for ultra-low-k dielectrics in microelectronic devices. Studies have shown that this building block is stable in acidic gels, but gradually opens when the gelation temperature and time exceed the "standard" conditions used for alkaline gels. |
| References | [1] F. GOETHALS. Ultra-low-k cyclic carbon-bridged PMO films with a high chemical resistance[J]. Journal of Materials Chemistry B, 2012, 77 1: 8281-8286. DOI:10.1039/C2JM30312D. [2] QUANCHANG LI. Template-Free Self-Assembly of Mesoporous Organosilicas[J]. Chemistry of Materials, 2018, 30 7: 2218-2228. DOI:10.1021/acs.chemmater.7b04480.
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1,1,3,3,5,5-hexaethoxy-1,3,5-trisilacyclohexane Preparation Products And Raw materials